Welcome to our book review site www.go-pdf.online!
You may have to Search all our reviewed books and magazines, click the sign up button below to create a free account.
Insulating and Semiconducting Glasses
This book covers the principal topical issues in the basic science of glasses and amorphous thin films. It also includes select applications of these materials in evolving technologies, including digital recording, imaging, solar cells, battery technology and field emission displays. The book can serve as a text for a graduate course in glass science. For an established researcher, it provides, in a concise form, an overview of the basic materials research aspect of these fascinating materials.
Multifrequency Electron Paramagnetic Resonance
Filling the gap for a systematic, authoritative, and up-to-date review of this cutting-edge technique, this book covers both low and high frequency EPR, emphasizing the importance of adopting the multifrequency approach to study paramagnetic systems in full detail by using the EPR method. In so doing, it discusses not only the underlying theory and applications, but also all recent advances -- with a final section devoted to future perspectives.
Properties and Applications of Amorphous Materials
The particular interest represented in this state of the art survey of amorphous materials is their electronic properties and device applications. The book is organised in five sections, starting with some more unusual aspects of structure. Section 2 deals with the very new area of self organisation in glasses and how this relates to a glass's rigidity. The next section surveys electronic states and transport phenomena. The fourth section deals with an area of photoinduced effects that has recently seen increased interest due to possible device applications. Finally, section 5 covers some properties specific to amorphous silicon and amorphous carbon.
Structure and Imperfections in Amorphous and Crystalline Silicon Dioxide
Structure and Imperfections in Amorphous and Crystalline Silicon Dioxide Edited by R. A. B. Devine, University of New Mexico, USA J.-P. Duraud, ESRF, Grenoble, France and E. Dooryhée, ESRF, Grenoble, France Silicon dioxide is one of the most common naturally occurring materials. Its applications range from nuclear waste storage to optical fibre communications to silicon microelectronics. Experts from America, Europe and Japan have written chapters covering both the amorphous and the crystalline phases of the material with particular reference to its structure and defects. The book is divided into four sections: Topological Models for the Crystalline and Amorphous Phases Electronic Structure Macroscopic and Point Defects Processing and Applications of Crystalline and Amorphous Phases Engineers, researchers and postgraduate students of materials science, physics and engineering will all find this an extremely useful addition to their libraries.
Complex Behaviour of Glassy Systems
For the first time this subject, including many systems of interest in Condensed Matter Physics, is treated in an unified way. Complexity emerges as one of the main ingredients dictating the collective behaviour of many systems. Glassy systems constitute one of the most interesting fields of Condensed Matter Physics for which also a considerable amount of experimental data and industial applications have been collected during the last twenty years. Systems exhibiting glassy behaviour are for example: real glasses, spin glasses, vortex flasses in superconductors, protein folding, etc. In this book the reader can see how the present theoretical understanding of these subjects is based on similar techniques and approaches hopefully allowing to develop a unifying structure that underlies the physical mechanism.
Amorphous and Crystalline Insulating Thin Films - 1996: Volume 446
This book is devoted to the continuing research and development of thin-dielectric films for optical and microelectronic applications. Although thermal SiO2 has been the dominant dielectric for thin films in microelectronic applications for many years, there is a growing need for low-dielectric constant materials for interlevel dielectrics (less capacitive cross-talk and reduced delay) and high-dielectric constant materials to minimize the space and maximize the capacitance of storage devices such as DRAMs. With the demands put forth by the microelectronics community, this field is expected to develop significantly in the near future. Also featured is the growing area involving the structure and characteriza-tion of buried a-SiO2 layers formed by O+ ion implantation or the Smart Cut Unibond® process. These techniques are evolving into viable methods for producing commercial silicon-on-insulator substrates for device applications requiring radiation hardness, high-speed and low-power performance, and high-temperature operation.
Phase Transformations and Evolution in Materials
This is a collection of papers presented at the TMS Annual Meeting & Exhibition, held in Nashville, Tennessee, in March, 2000. The symposium emphasizes both theoretical and experimental aspects of phase transformations and evolutions in materials. Topics addressed in papers include: mechanical properties of structurally heterogeneous systems; simulations of structural transformations; large-scale modelling of microstructure evolution in martensites; applying the concentration wave method to predict ordering phenomena in substitutional alloys and ceramic materials; and use of the phase field method to study coherent transformations.
Inorganic Materials
None
