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Rapid Thermal and Other Short-time Processing Technologies II
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Graphene
Aggregated Book
Doping Engineering for Device Fabrication: Volume 912
This volume from the 2006 MRS Spring Meeting focuses on fundamental materials science and device research for current transistor technologies. Materials scientists come together with silicon technologists and TCAD researchers and activation technologies for integrated circuits, to discuss current achievements research directions.
Ion Impantation Technology
This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
Doping Engineering for Front-End Processing: Volume 1070
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
