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A unique and well-organized reference, this book provides illuminating data, distinctive insight and expert guidance on silicon properties.
Covering materials, processes, equipment, methodologies, characterization techniques, clean room practices, and ways to control contamination-related defects, this work offers up-to-date information on the application of interconnection technology to semiconductors. It offers an integration of technical, patent and industry literature.
VLSI Electronics Microstructure Science, Volume 15: VLSI Metallization discusses the various issues and problems related to VLSI metallization. It details the available solutions and presents emerging trends. This volume is comprised of 10 chapters. The two introductory chapters, Chapter 1 and 2 serve as general references for the electrical and metallurgical properties of thin conducting films. Subsequent chapters review the various aspects of VLSI metallization. The order of presentation has been chosen to follow the common processing sequence. In Chapter 3, some relevant metal deposition techniques are discussed. Chapter 4 presents the methods of VLSI lithography and etching. Conducting f...
This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
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